Mechanisms of He escape during implantation in CuNb multilayer composites Conference Paper uri icon

abstract

  • CuNb multilayer composites with layer thicknesses as small as 4 nm have shown remarkable resistance to radiation damage at room temperature. The technological importance of these materials, however, depends on their radiation damage resistance properties at elevated temperatures. We investigated the degree of retention of 33 keV 4He+ implanted at temperatures ranging from 490 °C to 660 °C in CuNb multilayer composites with layer thicknesses from 4 nm to 100 nm. Analysis by elastic recoil detection (ERD) with 12 MeV 12C3+ beam demonstrates that the fraction of retained He decreases with increasing temperature and decreasing layer thickness, suggesting that interfaces between neighboring Cu and Nb layers serve as pathways for fast diffusion of implanted He out of the CuNb multilayer composites. Atomic-scale simulations of radiation damage cascades indicate that this property stems from the ability of CuNb interfaces to quickly absorb defects created during these cascades.

author list (cited authors)

  • Demkowicz, M. J., Wang, Y. Q., Hoagland, R. G., & Anderoglu, O.

citation count

  • 52

publication date

  • August 2007