Laser and electrical current induced phase transformation ofIn2Se3 semiconductor thin film on Si(111) Academic Article uri icon

abstract

  • Phase transformation of thin film (30 nm)In 2 Se 3 /Si(111) (amorphouscrystalline) was performed by resistive annealing and the reverse transformation (crystallineamorphous) was performed by nanosecond laser annealing. As an intrinsic-vacancy, binary chalcogenide semiconductor, In 2 Se 3 is of interest for non-volatile phase-change memory. Amorphous In x Se y was deposited at room temperature on Si(111) after pre-deposition of a crystalline In 2 Se 3 buffer layer (0.64 nm). Upon resistive annealing to 380C, the film was transformed into a -In 2 Se 3 single crystal with its {0001} planes parallel to the Si(111) substrate and (1120) parallel to Si (110), as evidenced by scanning tunneling microscopy, low energy electron diffraction, and X-ray diffraction. Laser annealing with 20-ns pulses (0.1 millijoules/pulse, fluence 50 mJ/cm 2 ) re-amorphized the region exposed to the laser beam, as observed with photoemission electron microscopy (PEEM). The amorphous phase in PEEM appears dark, likely due to abundant defect levels inhibiting electron emission from the amorphous In x Se y film. 2008 Springer-Verlag.

published proceedings

  • Applied Physics A

author list (cited authors)

  • Lu, C., Shamberger, P. J., Yitamben, E. N., Beck, K. M., Joly, A. G., Olmstead, M. A., & Ohuchi, F. S.

publication date

  • January 1, 2008 11:11 AM